Drawing apparatus, lithography system, pattern data creation method, drawing method, and method of manufacturing articles
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United States of America Patent
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Feb 28, 2017
Grant Date -
May 5, 2016
app pub date -
Oct 21, 2015
filing date -
Oct 27, 2014
priority date (Note) -
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status (Latency Note)
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Abstract
At least one drawing apparatus according to an exemplary embodiment includes a plurality of optical systems and repeats an operation to draw a pattern on a substrate while partly overlapping stripe-shaped regions drawn by the optical systems. The drawing apparatus includes a creation unit configured to create data to be supplied to each of the plurality of optical systems by using a plurality of sub pattern data, each of the plurality of sub pattern data serving as unit data of pattern data used by the plurality of optical systems, corresponding to a region having a width obtainable by dividing the stripe-shaped regions in a drawing width direction, and including information relating to continuity of drawing instruction data and exposure amount information. The creation unit is configured to create the data by changing exposure amount information corresponding to an overlapping drawing region based on the information relating to the continuity.
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