METHOD OF MANUFACTURING MAGNETORESISTIVE MEMORY DEVICE AND MANUFACTURING APPARATUS OF THE SAME

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United States of America Patent

APP PUB NO 20160130693A1
SERIAL NO

14645254

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Abstract

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According to one embodiment, a method of manufacturing a magnetoresistive memory device includes forming a first magnetic layer on a substrate, forming a cap layer on the first magnetic layer, heating a base including the cap layer after the cap layer is formed, forming a nonmagnetic layer on the cap layer while the base is heated, cooling the base including the nonmagnetic layer after the nonmagnetic layer is formed, and forming a second magnetic layer on the nonmagnetic layer after the base is cooled.

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Patent Owner(s)

Patent OwnerAddress
TOSHIBA MEMORY CORPORATION1-1 SHIBAURA 1-CHOME MINATO-KU TOKYO 105-0023

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
EEH, Youngmin Seoul, KR 46 237
NAGAMINE, Makoto Seoul, KR 49 1123
NAGASE, Toshihiko Seoul, KR 162 2994
SAWADA, Kazuya Seoul, KR 77 403
UEDA, Koji Seoul, KR 174 1361
WATANABE, Daisuke Seoul, KR 302 1640

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