Method and Apparatus for Monitoring Pulsed Plasma Processes

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United States of America Patent

APP PUB NO 20160131587A1
SERIAL NO

14509038

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Emitted light from a pulsed plasma system is detected, amplified and digitized over a plurality of pulse modulation cycles to produce a digitized signal over the plurality of RF modulation periods, each of which contains an amount of random intensity variations. The individual signal periods are then mathematically combined to produce a stable local reference waveform signal that has decreased random intensity variations. One mechanism for creating a stable local reference waveform signal is by subdividing each of the individual signal periods into a plurality of subunits and the mathematically averaging the respective subunits within the modulation period to produce the stable local reference waveform signal for the modulation period. The stable local reference waveform signal can then be compared to other instantaneous waveform signals from the pulsed plasma system, or waveform parameters can be derived using various signal processing techniques such as Fourier analysis.

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Patent Owner(s)

Patent OwnerAddress
VERITY INSTRUMENTS INC2901 EISENHOWER STREET CARROLLTON TX 75007

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bullock, Larry Arlos Carrollton, US 6 11
Kueny, Andrew Weeks Carrollton, US 17 697
Meloni, Mark Anthony Carrollton, US 11 65
Michals, Tim Charles Carrollton, US 1 3
Pylant, Christopher David Carrollton, US 1 3

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