REDUCTION OF AMBIENT GAS ENTRAINMENT AND ION CURRENT NOISE IN PLASMA BASED SPECTROMETRY
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United States of America Patent
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Issued Date -
May 12, 2016
app pub date -
Nov 11, 2014
filing date -
Nov 11, 2014
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Abstract
In a plasma source configured for producing sample atoms for analysis, such as by optical emission spectrometry or mass spectrometry, a plasma torch includes a torch exit in a chamber. A baffle is positioned between the torch exit and an opposing boundary. The baffle may be positioned and configured to suppress or eliminate vortex shedding in the chamber.
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