Method for determining wave-front aberration data of a to-be-tested optical system

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United States of America Patent

PATENT NO 10045690
APP PUB NO 20160135678A1
SERIAL NO

14897205

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A method for determining wave-front aberration data of a to-be-tested optical system comprising the steps of: a) providing a wave-front sensing image of light received from the tested optical system; b) providing a model representative of the optical system with at least an optical parameter representative of said model; and c) optimizing a set of wave-front coefficient data and said at least optical parameter of said model according to a merit function calculating the merit function comprises the steps of generating a wave-front sensing modeled image of light received from said model by the at least optical parameter and the set of wave-front coefficient data, and calculating a criteria based on shape parameter data of the wave-front sensing image and shape parameter data of the wave-front sensing modeled image, so as to obtain wave-front aberration data of the tested optical system.

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  • ESSILOR INTERNATIONAL

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hernandez, Castanedas Martha Charenton-le-Pont, FR 2 14
Liu, Tao Charenton-le-Pont, FR 555 3481
Marin, Gildas Charenton-le-Pont, FR 39 342
Thibos, Larry Charenton-le-Pont, FR 1 7

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