Polishing Composition and Polishing Method
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United States of America Patent
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app pub date -
Jan 22, 2016
filing date -
Apr 8, 2010
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Abstract
A polishing composition contains a polishing accelerator, a water-soluble polymer including a constitutional unit originating from a polymerizable compound having a guanidine structure such as dicyandiamide, and an oxidant. The water-soluble polymer may be a water-soluble polymer including a constitutional unit originating from dicyandiamide and a constitutional unit originating from formaldehyde, a diamine or a polyamine.
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