High precision, high resolution collimating shadow mask and method for fabricating a micro-display

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United States of America Patent

PATENT NO 10644239
APP PUB NO 20160141498A1
SERIAL NO

14941825

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Abstract

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The method for producing an OLED micro-display on a silicon wafer uses a collimating shadow mask formed on a silicon substrate. The mask is fabricated by depositing a material layer on the front side and on the back side of the substrate and etching a portion of the layer on the back side of the substrate to a reduced thickness of at least 20 microns. At least one opening is created in the etched portion of the substrate. The substrate beneath the opening is removed to create the mask. The mask is situated at a location spaced from the surface of the silicon wafer and exposed to a linear evaporation source. Organic layers are then deposited on the silicon wafer in a location aligned with the mask opening.

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Patent Owner(s)

Patent OwnerAddress
EMAGIN CORPORATION700 SOUTH DRIVE SUITE 201 HOPEWELL JUNCTION NY 12533

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ghosh, Amalkumar Hopewell Junction, US 2 21
Vazan, Fridrich Pittsford, US 46 782

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