METHOD FOR DOUBLE-SIDE VACUUM FILM FORMATION AND LAMINATE OBTAINABLE BY THE METHOD

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United States of America Patent

SERIAL NO

15009387

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Abstract

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The film formation method comprises the steps of: unrolling and feeding an elongated substrate wound in a roll form from a first roll chamber in a direction from the first roll chamber toward a second roll chamber, using a first surface as a surface for film formation; degassing the fed substrate; forming a first material film on the first surface of the degassed substrate in a first film formation chamber; forming a second material film on the first material film in a second film formation chamber; taking up the substrate in a roll form in the second roll chamber, the substrate having the material films formed thereon; unrolling and feeding the taken up substrate from the first roll chamber in the direction, using a second surface opposite the first surface of the substrate as a surface for film formation; and repeating all the above treatments.

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Patent Owner(s)

Patent OwnerAddress
NITTO DENKO CORPORATION1-2 SHIMOHOZUMI 1-CHOME IBARAKI-SHI OSAKA 567-8680

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HAMADA, Akira Osaka, JP 105 1080
ISHIBASHI, Kuniaki Osaka, JP 35 239
ITO, Yoshihisa Osaka, JP 67 345
NASHIKI, Tomotake Osaka, JP 90 671
SAKATA, Yoshimasa Osaka, JP 30 289
SUGAWARA, Hideo Osaka, JP 71 943
YAGURA, Kenkichi Osaka, JP 8 47

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