Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

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United States of America Patent

PATENT NO 10444627
APP PUB NO 20160147154A1
SERIAL NO

15011813

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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There are provided a pattern formation method, including:

    (1) forming a film using an active light-sensitive or radiation-sensitive resin composition;(2) exposing the film to active light or radiation; and(3) developing the exposed film using a developer including an organic solvent,wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific repeating units, and a crosslinking agent (C).

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Patent Owner(s)

  • FUJIFILM CORPORATION

International Classification(s)

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  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujimori, Toru Shizuoka, JP 69 524
Hirano, Shuji Shizuoka, JP 69 301
Nihashi, Wataru Shizuoka, JP 33 105
Takizawa, Hiroo Shizuoka, JP 119 917
Yokokawa, Natsumi Shizuoka, JP 27 119

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