Voltage contrast characterization structures and methods for within chip process variation characterization
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 13, 2016
Grant Date -
May 26, 2016
app pub date -
Nov 21, 2014
filing date -
Nov 21, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method for designing, a structure, method of inspecting and a computer system for designing voltage contrast integrated circuit characterization. The design method includes selecting a design level of a mask design shapes file; selecting a region of the design level having an open region having no design shapes and an adjacent circuit region having circuit design shapes; selecting a sub-region of the circuit region adjacent to the open region; copying design shapes of the sub-region to generate a characterization cell identical to the sub-region; modifying the characterization cell to generate a passive voltage contrast characterization cell; and placing the passive voltage contrast characterization cell into the open region adjacent to the sub-region to generate a modified design level.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully