DESIGN METHOD AND DESIGN APPARATUS

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United States of America Patent

APP PUB NO 20160154920A1
SERIAL NO

14928808

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A processor arranges a first dummy pattern in each of a plurality of circuit blocks of a first layer included in hierarchical design data of a semiconductor device; sets an arrangement candidate region as a candidate for arranging a second dummy pattern in a region, which is located between a circuit block boundary and the first dummy pattern and in which the first dummy pattern is not arranged, in each of the plurality of circuit blocks; arranges the plurality of circuit blocks in an upper-layer region of a second layer higher than the first layer; and arranges the second dummy pattern in a portion formed by joining a first arrangement candidate region of a first circuit block and a second arrangement candidate region of a second circuit block, which contact each other, among the arrangement candidate regions of the plurality of circuit blocks arranged in the upper-layer region.

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Patent Owner(s)

Patent OwnerAddress
FUJITSU SEMICONDUCTOR LIMITED2-10-23 SHIN-YOKOHAMA KOHOKU-KU YOKOHAMA-SHI KANAGAWA 222-0033

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HARADA, Norihiro Kawagoe, JP 11 42

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