Composition for forming film having wrinkle structure and method of forming the film

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10472276
APP PUB NO 20160159686A1
SERIAL NO

14822417

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A composition for forming film having wrinkle structure and a method of forming the film are disclosed. The composition includes photo-curable agent and photoinitiator dissolved in the photo-curable agent. The cut off wavelength of light transmittance of the photo-curable agent is greater than the cut off wavelength of light absorbance of the photoinitiator. Photo-cured thin film is formed at the upper portion of composition layer at an initial time period of irradiation. By subsequent contraction, the photo-cured thin film forms wrinkles. The wrinkle structure is controlled by the relation of the cut off wavelength of light transmittance of the photo-curable agent and the cut off wavelength of light absorbance of the photoinitiator, the photo-curing rate of the composition and the thickness of the composition layer, and the photoinitiator concentration, etc., before photo-curing. The film may increase the emission efficiency of LED and OLED and the sensing effect of sensor.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

  • ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cho, Doo-Hee Daejeon, KR 63 284
Han, Jun-Han Daejeon, KR 40 190
Joo, Chul Woong Seoul, KR 37 143
Lee, Jeong Ik Daejeon, KR 108 770
Lee, Jonghee Daejeon, KR 32 99
Moon, Jaehyun Daejeon, KR 74 632
Park, Seung Koo Daejeon, KR 68 434
Yu, Byoung Gon Chungcheongbuk-do, KR 79 630

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
7.5 Year Payment $3600.00 $1800.00 $900.00 May 12, 2027
11.5 Year Payment $7400.00 $3700.00 $1850.00 May 12, 2031
Fee Large entity fee small entity fee micro entity fee
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00