PHOTOIMPRINTING RESIN COMPOSITION SOLUTION, PHOTOIMPRINTING RESIN THIN FILM, AND PATTERNING METHOD

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United States of America Patent

APP PUB NO 20160160074A1
SERIAL NO

14583793

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Abstract

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A photoimprinting resin composition solution is provided. The photoimprinting resin composition solution includes a monomer or a polymer having an epoxy group, a cationic photopolymerization initiator, a thermoplastic resin, and a solvent. The weight-average molecular weight of the thermoplastic resin is 500 to 50000, and the thermoplastic resin does not react with the monomer or the polymer having an epoxy group and the cationic photopolymerization initiator.

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Patent Owner(s)

Patent OwnerAddress
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE195 SEC 4 CHUNG HSING RD CHUTUNG HSINCHU 310401

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Ping-Chen Taipei City, TW 34 172
Wu, Yaw-Ting Taoyuan City, TW 14 48

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