ELECTROLESS PLATING APPARATUS

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United States of America Patent

SERIAL NO

15043425

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Abstract

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There is provided an electroless plating apparatus which, despite using a high-productivity batch processing method, can reduce the amount of a liquid chemical brought out of a processing tank, thereby reducing the cleaning time in a cleaning step, and can perform flushing easily and quickly. The electroless plating apparatus includes a pre-plating treatment module including a pre-plating treatment tank, a plating module, and an inter-module substrate transport device. The pre-plating treatment tank is provided with a pre-plating treatment solution circulation line having a temperature control function for a pre-plating treatment solution. The plating tank is provided with a plating solution circulation line having a filter and a temperature control function for a plating solution. The plating solution circulation line is connected to a flushing line for flushing the interior of the plating solution circulation line and the interior of the plating tank.

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Patent Owner(s)

Patent OwnerAddress
EBARA CORPORATION11-1 HANEDA ASAHI-CHO OTA-KU TOKYO 144-8510

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ARAI, Kenichiro Kyoto, JP 47 276
KANDA, Hiroyuki Tokyo, JP 72 645
KUBOTA, Makoto Tokyo, JP 217 2818
MINE, Junko Tokyo, JP 12 57
NAKADA, Tsutomu Tokyo, JP 62 1346
TSUJINO, Junichiro Tokyo, JP 7 28

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