Barrier film techniques and configurations for phase-change memory elements

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United States of America Patent

PATENT NO 9419212
SERIAL NO

14562473

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Abstract

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Embodiments of the present disclosure describe barrier film techniques and configurations for phase-change memory elements. In an embodiment, an apparatus includes a plurality of phase-change memory (PCM) elements, wherein individual PCM elements of the plurality of PCM elements include a bottom electrode layer, a select device layer disposed on the bottom electrode layer, a middle electrode layer disposed on the select device layer, a phase-change material layer disposed on the middle electrode layer, a top electrode layer disposed on the phase-change material layer, and a barrier film comprising a group IV transition metal, a group VI transition metal, carbon (C) and nitrogen (N), the barrier film being disposed between the bottom electrode layer and the top electrode layer. Other embodiments may be described and/or claimed.

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  • INTEL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Collins, Dale W Boise, US 54 273
Hu, Yongjun J Boise, US 29 173
McTeer, Allen Santa Clara, US 91 1441
Petz, Christopher W Boise, US 39 116

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