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Abstract

The present invention relates to a method for producing an electrode for OLEDs, comprising the following successive steps:

(a) depositing, on a transparent substrate, a metal film composed of silver or of an alloy of silver having a thickness in the range between 35 and 70 nm, preferably between 45 and 65 nm;(b) heating the substrate covered with the metal film to a temperature in the range between 200° C. and 400° C., for a period of at least 5 minutes, preferably in the range between 20 and 60 minutes, so as to obtain the dewetting of the metal film and the formation of a random metal grid on the transparent substrate;(c) covering the transparent substrate and the random metal grid with a continuous layer of a transparent conductive material.

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First Claim