FinFET with a silicon germanium alloy channel and method of fabrication thereof

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United States of America Patent

PATENT NO 10446650
APP PUB NO 20160172448A1
SERIAL NO

15048709

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Abstract

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A gate cavity is formed exposing a portion of a silicon fin by removing a sacrificial gate structure that straddles the silicon fin. An epitaxial silicon germanium alloy layer is formed within the gate cavity and on the exposed portion of the silicon fin. Thermal mixing or thermal condensation is performed to convert the exposed portion of the silicon fin into a silicon germanium alloy channel portion which is laterally surrounded by silicon fin portions. A functional gate structure is formed within the gate cavity providing a finFET structure having a silicon germanium alloy channel portion which is laterally surrounded by silicon fin portions.

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Patent Owner(s)

  • INTERNATIONAL BUSINESS MACHINE CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cheng, Kangguo Schenectady, US 3065 29546
Doris, Bruce B Slingerlands, US 796 13211
He, Hong Schenectady, US 1174 7692
Khakifirooz, Ali Los Altos, US 841 11850

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