Gate-all-around fin device

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United States of America Patent

PATENT NO 9818542
SERIAL NO

14882800

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Abstract

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A gate-all around fin double diffused metal oxide semiconductor (DMOS) devices and methods of manufacture are disclosed. The method includes forming a plurality of fin structures from a substrate. The method further includes forming a well of a first conductivity type and a second conductivity type within the substrate and corresponding fin structures of the plurality of fin structures. The method further includes forming a source contact on an exposed portion of a first fin structure. The method further comprises forming drain contacts on exposed portions of adjacent fin structures to the first fin structure. The method further includes forming a gate structure in a dielectric fill material about the first fin structure and extending over the well of the first conductivity type.

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Patent Owner(s)

  • INTERNATIONAL BUSINESS MACHINES CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Campi,, Jr John B Westford, US 40 440
Gauthier,, Jr Robert J Hinesburg, US 209 2339
Mishra, Rahul Essex Junction, US 99 2378
Mitra, Souvick Essex Junction, US 132 1222
Muhammad, Mujahid Essex Junction, US 54 627

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