PASSIVE DEVICE AND MANUFACTURING METHOD THEREOF

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United States of America Patent

APP PUB NO 20160181242A1
SERIAL NO

14960501

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Abstract

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The present invention relates to a passive device and manufacturing method thereof. A capacitor according to the present invention includes: a capacitor thin film pattern formed on the upper surface of a substrate; a plurality of trenches formed by etching the substrate formed with the capacitor thin film pattern which defines the unit area of the capacitor; an insulation layer, which fills the trench, formed with capacitor interconnection holes for exposing the metal layers formed in the substrate and constituting the capacitor; and a plurality of capacitor electrode interconnection wires formed by filling the capacitor interconnection holes with a conductive material, wherein the lower surface of the substrate is being polished in a way that the insulation layer formed in the trenches is exposed.

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Patent Owner(s)

Patent OwnerAddress
KOREA ELECTRONICS TECHNOLOGY INSTITUTE25 SAENARI-RO BUNDANG-GU SEONGNAM-SI GYEONGGI-DO 13509 13509

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KIM, Dong Su Seongnam-si, KR 41 88
KIM, Jun Chul Seongnam-si, KR 18 54
PARK, Jong Chul Suwon-si, KR 45 814
PARK, Se Hoon Seongnam-si, KR 25 28
RYU, Jong In Seoul, KR 27 137
YOOK, Jong Min Seongnam-si, KR 13 12

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