Trench epitaxial growth for a FinFET device having reduced capacitance

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United States of America Patent

PATENT NO 9755031
SERIAL NO

14577431

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Abstract

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A FinFET device includes a semiconductor fin, a gate electrode extending over a channel of the fin and sidewall spacers on each side of the gate electrode. A dielectric material is positioned on each side of a bottom portion of said fin, with an oxide material on each side of the fin overlying the dielectric material. A recessed region, formed in the fin on each side of the channel region, is delimited by the oxide material. A raised source region fills the recessed region and extends from the fin on a first side of the gate electrode to cover the oxide material to a height which is in contact with the sidewall spacer. A raised drain region fills the recessed region and extends from the fin on a second side of the gate electrode to cover the oxide material to a height which is in contact with the sidewall spacer.

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Patent Owner(s)

  • GLOBALFOUNDRIES INC.;INTERNATIONAL BUSINESS MACHINES CORPORATION;STMICROELECTRONICS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cai, Xiuyu Niskayuna, US 195 3738
Liu, Qing Watervliet, US 483 5038
Xie, Ruilong Schenectady, US 1413 10685
Yeh, Chun-Chen Clifton Park, US 417 3455

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