EPITAXIAL STRUCTURE AND GROWTH THEREOF

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United States of America Patent

APP PUB NO 20160190259A1
SERIAL NO

14586270

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Abstract

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The invention provides an epitaxial growth structure and a growth method thereof. The epitaxial growth structure comprises a substrate, a plurality of seeds, a plurality of nanorods and a film. The seeds arranged in an array are disposed on a surface of the substrate. The nanorods are disposed longitudinally on the seeds, respectively. The film covers horizontally on upper surfaces of the nanorods to form a substantial plane.

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Patent Owner(s)

Patent OwnerAddress
NATIONAL TSING HUA UNIVERSITYNO 101 SEC 2 GUANGFU RD EAST DIST HSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHENG, Keh-Yung Hsinchu City, TW 11 27
CHIU, Shao-Yen Hsinchu City, TW 4 16
LEE, Pin-Yi Hsinchu City, TW 1 0
WANG, Yu-Li Hsinchu City, TW 5 14
WU, Chun-Hung Hsinchu City, TW 50 82

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