PLASMA PROCESSING APPARATUS
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United States of America Patent
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Issued Date -
Jul 7, 2016
app pub date -
Jul 9, 2014
filing date -
Jul 9, 2014
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Abstract
A plasma processing apparatus, comprising at least one sealed chamber (2), a vacuum device and working gas feed device in communication with the sealed chamber (2), and a plasma processing device and a garment support mechanism (5) arranged inside the sealed chamber (2); the plasma processing device comprises at least two parallel spaced electrode plates (41), and the garment support mechanism (5) comprises a support frame (51) provided between every two adjacent electrode plates (41) and used for supporting at least one garment (1) and fully opening the garment (1). The present plasma processing apparatus simultaneously plasma processes a plurality of garments (1) on a plurality of support frames (51); according to requirements, the necessary working gas is fed and imparts the garments (1) with different properties; the apparatus allows processing to be done in bulk, improves plasma garment processing speed, and is suitable for use in industrial processing.
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