Mask blank, transfer mask and methods of manufacturing the same
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United States of America Patent
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Jul 30, 2019
Grant Date -
Jul 14, 2016
app pub date -
May 19, 2014
filing date -
May 23, 2013
priority date (Note) -
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Abstract
In a mask blank having a structure in which a light-semitransmissive film and a light-shielding film are laminated on a main surface of a transparent substrate, the light-semitransmissive film is made of a material that can be dry-etched with an etching gas containing a fluorine-based gas, the light-shielding film is made of a material that contains tantalum and one or more elements selected from hafnium and zirconium and contains no oxygen except in a surface layer thereof, an etching stopper film is provided between the light-semitransmissive film and the light-shielding film, and the etching stopper film is made of a material that contains chromium with an oxygen content of 20 at % or less.
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