LOCAL DRY ETCHING APPARATUS AND LOCAL DRY ETCHING FABRICATION METHOD
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Jul 14, 2016
app pub date -
Sep 4, 2014
filing date -
Sep 4, 2014
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A local dry etching apparatus includes a vacuum chamber, a single workpiece table, a plurality of discharge tubes, a raw material gas supply device for supplying a raw material gas to a selected discharge tube, a single electromagnetic wave oscillator capable of output adjustment, and waveguides provided with an electromagnetic wave switcher. A discharge tube selected from the plurality of discharge tubes to be irradiated with the electromagnetic wave is switched sequentially by the electromagnetic wave switcher.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully