SUPPORT STAGE FOR VACUUM APPARATUS
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United States of America Patent
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Issued Date -
Jul 14, 2016
app pub date -
Dec 29, 2015
filing date -
Jan 14, 2015
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Abstract
Apparatus for supporting a substrate (11) in respect of a vacuum system comprising a vacuum chamber, a cooling system (12), and a cradle (6) for supporting a substrate holder and configured such that, in use, the substrate holder is thermally coupled with said cooling system, the apparatus comprising a substrate holder (20, 20′) comprising a thermally conductive diaphragm spring (9, 9′) mounted within a support ring and defining a slot (11a) therebetween for receiving a substrate (11), in use.
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