POLISHING COMPOSITION
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United States of America Patent
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Sep 2, 2014
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Sep 30, 2013
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Abstract
The present invention provides a polishing composition having excellent storage stability. The present invention relates to a polishing composition including abrasive grains and an oxidant containing a halogen atom, a value (A/B) obtained by dividing the total number (A) (unit: number) of silanol groups contained in the abrasive grains in the polishing composition by a concentration (B) (unit: % by mass) of the oxidant in the polishing composition being 8×1023 or less.
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