Polishing composition and method for producing same

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United States of America Patent

PATENT NO 9944838
SERIAL NO

14917728

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Abstract

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Provided is a polishing composition with which haze and surface defects can be reduced. This invention provides a polishing composition comprising a synthetic water-soluble polymer ML-end that has a hydrophobic region at least at one end of its main chain. The hydrophobic region has at least one hydrophobic group derived from a polymerization initiator.

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Patent Owner(s)

  • FUJIMI INCORPORATED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mori, Yoshio Kiyosu, JP 53 702
Tsuchiya, Kohsuke Kiyosu, JP 35 88

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