STAND ALONE ANNEAL SYSTEM FOR SEMICONDUCTOR WAFERS

United States of America Patent

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Issued Date
Aug 18, 2016
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Feb 12, 2015
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Feb 12, 2015

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Abstract

A high throughput stand-alone anneal system has a horizontal row of docking stations at a front wall of an enclosure. A rack in the enclosure has a plurality of vertically stacked anneal modules. Robots within the enclosure move wafers from the docking stations to one of the anneal modules for rapid thermal anneal processing.

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APPLIED MATERIALS INC	3050 BOWERS AVENUE SANTA CLARA CA 95054

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Inventor Name	Address	# of filed Patents	Total Citations
Francischetti, Vincent Steffan	Columbia Falls, US	5	12
Moore, Robert B	Bigfork, US	40	802
Shaviv, Roey	Palo Alto, US	69	1107
Silvetti, Mario David	Morgan Hill, US	19	556

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STAND ALONE ANNEAL SYSTEM FOR SEMICONDUCTOR WAFERS

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14620420

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14620420

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