MULTI-PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
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United States of America Patent
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Aug 18, 2016
app pub date -
Sep 2, 2015
filing date -
Feb 18, 2015
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Abstract
A multi-processing apparatus includes an electron beam irradiation unit, a dry etching unit and a transfer unit. The transfer unit is connected to the electron beam irradiation unit and the dry etching unit, and is configured to transfer a wafer under a reduced-pressure atmosphere from the electron beam irradiation unit to the dry etching unit.
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