FORM FITTING GARMENTS AND METHODS FOR MAKING SAME
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United States of America Patent
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Issued Date -
Sep 1, 2016
app pub date -
Feb 24, 2016
filing date -
Feb 26, 2015
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Abstract
A seamless base layer garment can be made using a whole garment-rectilinear knitting machine. The garment can be knitted on the whole garment-rectilinear knitting machine using a yarn comprising an elastic core strand, and a plurality of cover strands. One cover strand can be made of polyester, polypropylene, polyamide, wool, cotton, viscose, aramid, flame retardant viscose fiber, and/or modacrylic. Another cover strand can be made of silver, copper, ceramic fiber and/or carbon fiber. The garment can be form fitting, and have the feel of a second skin to the wearer.
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