Alignment of single-mode polymer waveguide (PWG) array and silicon waveguide (SiWG) array of providing adiabatic coupling

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United States of America Patent

PATENT NO 9658411
APP PUB NO 20160252686A1
SERIAL NO

15152853

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Abstract

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A structure includes a combination of a stub fabricated on a polymer and a groove fabricated on a silicon (Si) chip, with which an adiabatic coupling can be realized by aligning a (single-mode) polymer waveguide (PWG) array fabricated on the polymer with a silicon waveguide (SiWG) array fabricated on the silicon chip. The stub fabricated on the polymer is patterned according to a nano-imprint process along with the PWG array in a direction in which the PWG array is fabricated. The groove fabricated on the silicon chip is fabricated along a direction in which the SiWG array is fabricated.

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Patent Owner(s)

  • INTERNATIONAL BUSINESS MACHINES CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Numata, Hidetoshi Kanagawa, JP 40 389
Taira, Yoichi Tokyo, JP 75 1306
Tokunari, Masao Kanagawa, JP 42 202

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