Reflective Photomask, Method for Inspecting Same and Mask Blank
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United States of America Patent
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Issued Date -
Sep 15, 2016
app pub date -
Sep 1, 2015
filing date -
Sep 1, 2015
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
According to an embodiment, a reflective photomask includes a substrate, a first layer on the substrate and a second layer on the first layer. The first layer is capable of receiving a first light, and emitting electrons. The second layer has an opening of a predetermined pattern, and is capable of reflecting a second light.
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