EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD OF DEVICE
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United States of America Patent
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Issued Date -
Sep 15, 2016
app pub date -
Jul 28, 2015
filing date -
Jul 28, 2015
priority date (Note) -
Abandoned
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Abstract
According to one embodiment, there is provided an exposure apparatus including a height measuring machine and a controller. The height measuring machine measures a height of a substrate coated with a photosensitive material. The controller can switch a condition under which the height measuring machine can perform a measurement, between a first measurement condition and a second measurement condition.
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