Process for producing liquid discharge head
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United States of America Patent
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Feb 12, 2019
Grant Date -
Sep 22, 2016
app pub date -
Feb 16, 2016
filing date -
Mar 20, 2015
priority date (Note) -
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status (Latency Note)
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Abstract
A process for producing a liquid discharge head including a substrate having a liquid supply path passing through from its first surface to second surface and an discharge port forming member having a discharge port communicating with the supply path through a flow path, the process including providing a first layer of photosensitive resin in a region covering an opening of the supply path in the first surface; forming a latent image of a pattern of the flow path in the first layer by exposure; providing a second layer of negative photosensitive resin on the first layer; curing a portion, opposing to the opening of the supply path in the first surface, of the second layer; forming a latent image of a pattern of the discharge port in the second layer by exposure; and developing latent images of patterns of the flow path and discharge port.
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