Wafer Design UV Reactor
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United States of America Patent
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Issued Date -
Sep 22, 2016
app pub date -
Dec 13, 2014
filing date -
Dec 14, 2013
priority date (Note) -
Published
status (Latency Note)
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Abstract
An UV reactor system that allows single or multiple flange-less reactors to be installed between the flanges of existing piping systems. Benefits include reduced installation space and lamp placement flexibility to improve UV treatment. Each reactor can be rotated, pre and post installation, to provide multiple positions for the radiation sources that are included in each reactor.
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Family
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Cited Art Landscape
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