Polishing composition, method for producing polishing composition and polishing composition preparation kit
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United States of America Patent
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Jul 16, 2019
Grant Date -
Sep 22, 2016
app pub date -
Mar 14, 2014
filing date -
Mar 19, 2013
priority date (Note) -
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Abstract
Provided are a polishing composition comprising a water-soluble polymer that has a molecular structure comprising a plurality of repeat unit species having different SP values and a polishing composition exhibiting an etching rate and an abrasive adsorption in prescribed ranges when determined by prescribed methods. Also provided is a method for producing a polishing composition, using an abrasive, a basic compound, a water-soluble polymer having an alkaline-hydrolytic functional group, and water. The method comprises a step of obtaining an agent A comprising at least the basic compound and a step of obtaining an agent B comprising at least the water-soluble polymer H.
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