METHOD FOR MONITORING SE VAPOR IN VACUUM REACTOR APPARATUS
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United States of America Patent
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Issued Date -
Sep 22, 2016
app pub date -
Oct 16, 2014
filing date -
Oct 16, 2014
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Abstract
Methods and systems are disclosed for monitoring vapor in a vacuum reactor apparatus. An system has (a) a vacuum chamber, (b) a vapor source housed in the vacuum chamber, wherein the vapor source is configured to generate a vapor, (c) a reaction vessel housed in the vacuum chamber and coupled to the vapor source, where the reaction vessel has an outlet to the vacuum chamber, and where the reaction vessel is configured to receive the vapor from the vapor source and to emit a portion of the received vapor into the vacuum chamber through the outlet, and (d) one or more sensors housed in the vacuum chamber, where the one or more sensors are configured to detect the vapor emitted through the outlet.
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