Reflective photomask, method for manufacturing same and program for making mask pattern
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United States of America Patent
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Dec 12, 2017
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N/A
app pub date -
Sep 3, 2015
filing date -
Mar 16, 2015
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Abstract
A reflective photomask includes a substrate and a reflective layer on the substrate. The reflective layer has a top surface opposite to the substrate and a reflectivity distribution on the top surface. The reflective layer includes mask patterns, the mask patterns having sizes depending on the reflectivity distribution. The mask patterns include a first pattern and a second pattern, the first pattern having a first space size smaller than a second space size of the second pattern. The first pattern is provided in a first region of the top surface, and the second pattern is provided in a second region of the top surface, wherein a reflectivity in the first region is lower than a reflectivity in the second region.
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