Multi-beam writing of pattern areas of relaxed critical dimension

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United States of America Patent

PATENT NO 9653263
SERIAL NO

15073200

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Abstract

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To irradiate a target with a beam of energetic electrically charged particles, the beam is formed and imaged onto a target, where it generates a pattern image composed of pixels. For a pattern which comprises a primary pattern region to be written with a predetermined primary feature size and a secondary pattern region which is composed of structure features capable of being written with a secondary feature size, larger than the primary feature size. The structure features of the primary pattern region are written by exposing a plurality of exposure spots on grid positions of a first exposure grid; the structure features in the secondary pattern region are written by exposing a plurality of exposure spots on grid positions of a second exposure grid according to a second arrangement which is coarser that the regular arrangement of the first exposure grid.

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Patent Owner(s)

  • IMS NANOFABRICATION AG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Platzgummer, Elmar Vienna, AT 59 3120
Schiessl, Klaus Vienna, AT 2 41

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