Method for manufacturing liquid discharge apparatus and liquid discharge apparatus
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United States of America Patent
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Feb 20, 2018
Issued Date -
N/A
app pub date -
Mar 24, 2016
filing date -
Mar 24, 2015
priority date (Note) -
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Abstract
There is provided a method for manufacturing a liquid discharge apparatus including: forming a photoresist film made of a photoresist on a silicon substrate; exposing the photoresist film; forming a nozzle in the photoresist film by exposing the photoresist film and then developing the photoresist film; forming a channel hole in communication with the nozzle by carrying out an etching process from a surface of the substrate on the opposite side from the photoresist film after forming the nozzle; and joining a channel member to the surface of the substrate on the opposite side from the photoresist film, the channel member including a pressure chamber in communication with the channel hole and a piezoelectric element formed as a film to correspond to the pressure chamber.
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