Hydrofluoroolefin Etching Gas Mixtures
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United States of America Patent
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Issued Date -
Sep 29, 2016
app pub date -
Mar 28, 2014
filing date -
Mar 28, 2014
priority date (Note) -
Abandoned
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Abstract
The present invention relates to hydrofluorolefin compositions useful for removing surface deposits in CVD chambers, and relates to methods for removing surface deposits from the interior of a chemical vapor deposition chamber by using an activated gas mixture created by activating a gas mixture in the chamber or in a remote chamber, where the gas mixture comprises a hydrofluorolefin.
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