Resist composition and method for producing resist pattern

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United States of America Patent

PATENT NO 9946157
SERIAL NO

15085386

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Abstract

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A resist composition contains: a novolak resin (A1) having a protective group capable of being cleaved by action of an acid, an acid generator (B), an anticorrosive agent (G), and a solvent (D) as well as a method for producing a resist pattern includes steps (1) to (4); (1) applying the resist composition according to the above onto a substrate; (2) drying the applied composition to form a composition layer; (3) exposing the composition layer; and (4) developing the exposed composition layer.

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Patent Owner(s)

  • SUMITOMO CHEMICAL COMPANY, LIMITED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akita, Makoto Osaka, JP 15 104
Kawamura, Maki Osaka, JP 9 45

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