Resin, resist composition and method for producing resist pattern

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10101657
APP PUB NO 20160291467A1
SERIAL NO

15085443

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A resist composition contains: a resin having an acid-labile group, a resin having a structural unit represented by formula (I), an acid generator, and a solvent;

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

  • SUMITOMO CHEMICAL COMPANY, LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nishimura, Takashi Osaka, JP 253 2513
Sugihara, Masako Osaka, JP 23 251

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
7.5 Year Payment $3600.00 $1800.00 $900.00 Apr 16, 2026
11.5 Year Payment $7400.00 $3700.00 $1850.00 Apr 16, 2030
Fee Large entity fee small entity fee micro entity fee
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00