SPUTTERING DEVICE AND METHOD FOR REPLACING FILM ROLL IN SPUTTERING DEVICE
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United States of America Patent
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Issued Date -
Oct 6, 2016
app pub date -
Oct 10, 2014
filing date -
Oct 10, 2014
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Abstract
In a sputtering device, a supply-side film roll chamber includes a supply-side vacuum pump and a supply-side main valve. A storage-side film roll chamber includes a storage-side vacuum pump and a storage-side main valve. A supply-side load-lock valve is provided between the supply-side film roll chamber and a layer forming chamber. A storage-side load-lock valve is provided between the storage-side film roll chamber and the layer forming chamber. In a method for replacing a film roll, a supply-side main valve and a supply-side load-lock valve are closed when replacing a supply-side film roll. A storage side-main valve and a storage-side load-lock valve are closed when replacing a storage-side film roll.
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