IN-SITU OPTICAL MONITORING OF FABRICATION OF INTEGRATED COMPUTATIONAL ELEMENTS
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United States of America Patent
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Oct 13, 2016
app pub date -
Dec 24, 2013
filing date -
Dec 24, 2013
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Abstract
Techniques include receiving a design of an integrated computational element (ICE), the ICE design including specification of a substrate and a plurality of layers, their respective target thicknesses and complex refractive indices, complex refractive indices of adjacent layers being different from each other, and a notional ICE fabricated in accordance with the ICE design being related to a characteristic of a sample over an operational wavelength range; forming at least some of the layers of the ICE in accordance with the ICE design; optically monitoring, during the forming, optical properties of the formed layers using quasi-monochromatic probe-light having a probe wavelength that is outside of the operational wavelength range of the ICE; and adjusting the forming, at least in part, based on the optically monitored optical properties of the formed layers of the ICE.
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