APPARATUS AND PROCESS FOR ANNEALING OF ANTI-FINGERPRINT COATINGS
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Oct 13, 2016
app pub date -
Nov 13, 2014
filing date -
Nov 14, 2013
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Abstract
The present invention addresses an in-situ annealing station for treating a substrate in an atmosphere of controlled water vapour pressure at a defined temperature. Such a station can be integrated as a process chamber into a multi chamber processing tool in which an anti-fingerprint coating process is being performed. The substrate is always under vacuum conditions until the annealing process has finished. Experimental data show that a significant reduction of the subsequent ex-situ curing duration can be achieved compared to Prior Art by introducing this in-situ treatment in water vapour immediately after the anti-fingerprint coating step.
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