Radio Frequency Hat System
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United States of America Patent
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app pub date -
Apr 13, 2015
filing date -
Apr 13, 2015
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The present invention is directed to a radio frequency hat system for decreasing transmission power when conducting tests on the ground, which includes a first hat and a second hat. The first hat corresponds to a lower transmitting conformal IFF antenna, and the second hat corresponds to an upper transmitting conformal IFF antenna. The first hat and the second hat are made from frequency selective material (FSM). The first hat has a first hat dipole, and the second hat has a second hat dipole. The first hat dipole and the second hat dipole are able to transmit and receive communications at a decreased transmission level during testing.
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Family
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Cited Art Landscape
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