TANTALUM-CONTAINING FILM FORMING COMPOSITIONS AND VAPOR DEPOSITION OF TANTALUM-CONTAINING FILMS

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United States of America Patent

APP PUB NO 20160307708A1
SERIAL NO

15130702

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Tantalum-containing film forming compositions are disclosed, along with methods of synthesizing the same, and methods of forming Tantalum-containing films on one or more substrates via vapor deposition processes using the Tantalum-containing film forming compositions.

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Patent Owner(s)

Patent OwnerAddress
L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDEINTELLECTUAL PROPERTY DEPARTMENT 75 QUAI D'ORSAY F-75007 PARIS FRANCE

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
LANSALOT-MATRAS, Clément Princeton, US 40 107
NOH, Wontae Seoul, KR 22 89

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