Charged particle beam writing apparatus and charged particle beam writing method
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United States of America Patent
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Feb 20, 2018
Grant Date -
Oct 27, 2016
app pub date -
Mar 28, 2016
filing date -
Apr 21, 2015
priority date (Note) -
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Abstract
A charged particle beam writing apparatus includes a processing circuitry configured to calculate a third proximity effect correction irradiation coefficient where at least one correction irradiation coefficient term up to k-th order term, in correction irradiation coefficient terms of from a first order term to a n-th order term for a first proximity effect correction irradiation coefficient which does not take account of a predetermined effect, are replaced by at least one correction irradiation coefficient term up to the k-th order term, for a second proximity effect correction irradiation coefficient which takes account of the predetermined effect; and a processing circuitry configured to calculate a dose by using the third proximity effect correction irradiation coefficient.
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