Exposure apparatus and exposure method
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United States of America Patent
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Jan 2, 2018
Issued Date -
N/A
app pub date -
Feb 25, 2016
filing date -
Apr 27, 2015
priority date (Note) -
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Abstract
Complex and fine patterns may be formed by an exposure apparatus that decreases movement error of a stage including a beam generating section that generates a charged particle beam, a stage section that has a sample mounted thereon and moves the sample relative to the beam generating section, a detecting section that detects a position of the stage section, a predicting section that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section, and an irradiation control section that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount.
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